is a manufacturer of high thermal conductive substrates based on alumina technology for different applications. The company is a resident of the Skolkovo Foundation
The aluminum oxide technology is based on the combination of:
proprietary controlled deep anodization stage that forms a dielectric layer on the aluminum base – nanoporous Aluminum Oxide (Al₂O₃);
standard operations of microelectronics (vacuum and galvanic deposition of metals and photolithography);
high-tech quality control.
The technology was patented by the Russian Federation, a PCT application was filed
Metal-based alumina substrate
Electrochemically grown aluminum oxide layer
Dielectric-aluminum oxide
Low price. The RUSOXIDE substrates and plates are an alternative to expensive ceramics
No soldering of DBC to the copper baseplate
Aluminum baseplate instead of copper baseplate
High cycle resistance
High integral thermal conductivity
Production of the large areas substrates of any shapes
High thermal strength of the substrate
The thickness and layout of al oxide dielectric layer are manageable
Severnaya street, 1M/3 Vladimir, 600007
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